Author/Authors :
Vempaire، نويسنده , , D and Miraglia، نويسنده , , S and Sulpice، نويسنده , , A and Ortega، نويسنده , , L and Hlil، نويسنده , , E.K and Fruchart، نويسنده , , D and Pelletier، نويسنده , , J، نويسنده ,
Abstract :
Plasma-based ion implantation is used to modify the magnetic properties of a thin film of nickel first deposited by microwave plasma assisted sputtering. Implantation of nitrogen in the Ni layer produces the metastable phase Ni3N that does not exhibit magnetic properties. Ni and Ni3N phases are determined by X-ray characterization and the magnetic properties measured using the SQUID technique. The perspectives offered by PBII processing for the elaboration of magnetic micro-and nanostructure are briefly discussed.
Keywords :
magnetic materials , microwave plasma , Immersion implantation , Micro-nanotechnology
