A model for the development of biaxial alignment in yttria stabilized zirconia layers, deposited by unbalanced magnetron sputtering

Biaxially aligned YSZ layers were deposited by reactive DC sputtering with an unbalanced magnetron. These biaxially aligned YSZ layers have an [001] out-of-plane orientation and an [110] in-plane orientation. A model for the growth of this specific out-of-plane and in-plane orientation is proposed. The proposed model is based on two anisotropic mechanisms: anisotropic surface mobility of the metallic adatoms and anisotropy in lateral growth rate of the different [001] out-of-plane oriented grains.