• Title of article

    Atomic environment and interfacial structural order of TiAlN/Mo multilayers

  • Author/Authors

    Tavares، نويسنده , , C.J. and Rebouta، نويسنده , , L. and Rivière، نويسنده , , J.P. and Girardeau، نويسنده , , T. and Goudeau، نويسنده , , P. and Alves، نويسنده , , E. and Barradas، نويسنده , , N.P.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2004
  • Pages
    6
  • From page
    393
  • To page
    398
  • Abstract
    Multilayered TiAlN/Mo coatings were deposited by dc reactive magnetron sputtering in a custom-made chamber. In order to assess the composition of these coatings, a combined study of Extended X-ray Absorption Fine Structure (EXAFS) and Rutherford Backscattering Spectrometry (RBS) experiments were performed. Through the simulation of the EXAFS spectra, giving the local environment of the titanium atoms inside the nitride (TiAlN), a cubic phase has been evidenced with aluminium atoms occupying titanium sites. For modulation periods in the range of 3.6–11.8 nm, RBS simulations on these multilayers also enabled the determination of the level of intermixing that occurs at the interfaces as a function of the negative bias voltage and number of layers. It was observed that the intermixing width could be as high as 2.1 nm for the roughest samples (larger periods) or as low as 0.4 nm for those with the sharpest interfaces (smaller periods).
  • Keywords
    Multilayers , EXAFS , RBS , simulations , Roughness , Atomic environment
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2004
  • Journal title
    Surface and Coatings Technology
  • Record number

    1808600