Author/Authors :
Sadahiro، نويسنده , , T. and Matsuyama، نويسنده , , K. and Kiuchi، نويسنده , , M. and Matumoto، نويسنده , , T. and Takizawa، نويسنده , , T. and Sugimoto، نويسنده , , S. and Fukuda، نويسنده , , T. and Goto، نويسنده , , S.، نويسنده ,
Abstract :
Low-energy ion beam technique is useful for the study on ion–surface interaction and deposition processes. In the low-energy ion beam system, ions are accelerated and decelerated to a desired energy just before deposition. The high-energy neutrals contained in the low-energy ion beam cannot be decelerated and make damage in the deposition film. By rejecting high-energy neutrals from a low-energy ion beam, improvement of the quality of the beam might be achieved. Thus, we modified the low-energy ion beam deposition system in order to reduce them. With this modification, the amount of high-energy Ar neutrals in a 100-eV Ar+ ion beam was reduced to 0.5% in this work.
