Title of article
Some fundamental problems of pulse biased arc ion plating
Author/Authors
Wen، نويسنده , , L.S and Huang، نويسنده , , R.F.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
5
From page
1
To page
5
Abstract
Recent progresses in both fundamentals and technology of pulse biased arc ion plating (PBAIP) are described. They scope from thermodynamic nature of deposition technology to low temperature plasma physical features. The later includes plasma sheath, dust particles and electromagnetic analysis of pulse biased arc ion plating circuit.
Keywords
Thermodynamic nature of vapor deposition , Dust particles in plasma , Plasma sheath , Oscillations in biased arc plasma circuit
Journal title
Surface and Coatings Technology
Serial Year
2005
Journal title
Surface and Coatings Technology
Record number
1809234
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