Title of article :
Studies of the discharge properties of unbalanced magnetron sputtering system
Author/Authors :
Zongxin، نويسنده , , Mu and Guoqing، نويسنده , , Li and Deliang، نويسنده , , Che and Kaiyu، نويسنده , , Huang and Cui، نويسنده , , Liu، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
4
From page :
46
To page :
49
Abstract :
In this paper, an unbalanced magnetron sputtering system was set up using a conventional magnetron and a coaxial electro-solenoid. The discharge properties were experimentally investigated. The model of the voltage–current (V–I) property of the unbalanced magnetron sputtering (UBM) system was developed. The comparisons of the simulation with the experimental data indicated that the model expressed the discharge properties of the UBM sputtering system correctly.
Keywords :
Magnetron , Film , PLASMA
Journal title :
Surface and Coatings Technology
Serial Year :
2005
Journal title :
Surface and Coatings Technology
Record number :
1809250
Link To Document :
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