Title of article
Studies of the discharge properties of unbalanced magnetron sputtering system
Author/Authors
Zongxin، نويسنده , , Mu and Guoqing، نويسنده , , Li and Deliang، نويسنده , , Che and Kaiyu، نويسنده , , Huang and Cui، نويسنده , , Liu، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
4
From page
46
To page
49
Abstract
In this paper, an unbalanced magnetron sputtering system was set up using a conventional magnetron and a coaxial electro-solenoid. The discharge properties were experimentally investigated. The model of the voltage–current (V–I) property of the unbalanced magnetron sputtering (UBM) system was developed. The comparisons of the simulation with the experimental data indicated that the model expressed the discharge properties of the UBM sputtering system correctly.
Keywords
Magnetron , Film , PLASMA
Journal title
Surface and Coatings Technology
Serial Year
2005
Journal title
Surface and Coatings Technology
Record number
1809250
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