Influence of bias voltage on the growth of films by hybrid plasma ion implantation/deposition

Plasma-based ion implantation and deposition system (PBIID) has been proposed to make a processing system for surface modification of materials. Growth behaviors of gold films by pulsed cathodic arc with/without the simultaneous negative high-voltage pulse were studied. It has been shown that the deposition under the negative pulse showed a strong influence on surface morphology, i.e. increased the number of nuclei per unit area. A huge morphology contribution of deposited films due to the subsequent deposition, resputtering and mixing is observed under a negative bias.