Title of article :
Electron localization and resonant tunneling in uniform nanocrystalline silicon quantum dot systems
Author/Authors :
Chen، نويسنده , , X.Y. and Shen، نويسنده , , W.Z.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Abstract :
In this paper, we review our recent investigation of the electronic transport in hydrogenated nanocrystalline silicon thin film grown on crystalline silicon substrate. The variable magnetic-field Hall measurements have been applied to extract the separated carrier information about the nc-Si:H, c-Si and their interface, where the formation of two-dimensional electron gas is clearly observed. With a decrease in the temperature, the nc-Si:H thin film shows a transition from the extended state to the band-tail state, together with a positive magneto-conductivity at extremely low temperatures. These results reveal the good uniformity of the quantum dots in the nc-Si:H thin film and the electron localization. Furthermore, we have successfully observed clear step-like and spike-like structures for the electrons resonant tunneling through the quasi-2D and 0D states in the I–V curves of the nc-Si:H/c-Si diode under strong electric field at low temperatures.
Keywords :
Quantum interference theory , chemical vapor deposition , Resonant tunneling , Mobility spectrum analysis , Silicon , Nanostructure , Electron localization
Journal title :
Surface and Coatings Technology
Journal title :
Surface and Coatings Technology