Title of article :
Production of large area VHF plasma using ladder-shaped electrode
Author/Authors :
Takatsuka، نويسنده , , H. and Takeuchi، نويسنده , , Y. and Yamauchi، نويسنده , , Y. and Shioya، نويسنده , , T. and Kawai، نويسنده , , Y.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
4
From page :
972
To page :
975
Abstract :
A VHF SiH4/H2 plasma was produced using a ladder-shaped electrode of 1200 mm×141 mm. In this case, VHF power up to 200 W was fed to the ladder-shaped electrode through the matching box. The plasma parameters in mixture gas plasma of SiH4/H2 were measured with a heated Langmuir probe and examined as a function of gas mixture rate. A uniform VHF plasma was achieved over 1 m at the frequency of 60 MHz. Furthermore, when the concentration of SiH4 gas was increased, the ion saturation current decreased while the electron temperature increased.
Keywords :
Wall potential , Ladder-shaped electrode , Ion saturation current , Electron Temperature , VHF plasma
Journal title :
Surface and Coatings Technology
Serial Year :
2005
Journal title :
Surface and Coatings Technology
Record number :
1810300
Link To Document :
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