Title of article :
The effect of pulse sequence modulation and pulse energy on structural coating properties and coating composition
Author/Authors :
Bobzin، نويسنده , , K. and Lugscheider، نويسنده , , E. and Maes، نويسنده , , M.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
6
From page :
1560
To page :
1565
Abstract :
The ever-increasing tool and machine part performance require novel coatings and have led to the demand for complex, fine-grained structures and a graded composition of PVD coatings in order to fulfill the high demands. Pulsed power supplies offer an excellent opportunity to deposit non-conductive, high-quality coatings with outstanding deposition rates. Many papers report a positive effect of higher ionization and increased plasma density. In this paper, bipolar power supplies with a duplex, dual-cathode arrangement were used to vary coating composition and generate a graded layer in industrial coating equipment. For this purpose, the pulse energy was altered during deposition. The coating process was analyzed by both plasma diagnostics as well as common thin-film analytical techniques.
Keywords :
DMS dual magnetron sputtering , CrAlN , Pulse sequence modulation , PMS pulsed magnetron sputtering
Journal title :
Surface and Coatings Technology
Serial Year :
2005
Journal title :
Surface and Coatings Technology
Record number :
1810482
Link To Document :
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