Title of article :
Phase separation and formation of the self-organised layered nanostructure in C/Cr coatings in conditions of high ion irradiation
Author/Authors :
Hovsepian، نويسنده , , P.Eh. and Kok، نويسنده , , Y.N. and Ehiasarian، نويسنده , , A.P. and Haasch، نويسنده , , R. and Wen، نويسنده , , J.-G. and Petrov، نويسنده , , I.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
8
From page :
1572
To page :
1579
Abstract :
The paper discusses the effect of ion irradiation on a new type of nanoscale multilayer structure in C/Cr PVD coatings formed by a self-organisation mechanism. C/Cr coatings were deposited by the combined steered cathodic arc/unbalanced magnetron sputtering technique, at wide range of bias voltages, Ub from − 65 to − 550 V. Plasma diagnostics carried out by electrostatic probe measurements revealed that C/Cr films grow under conditions of intensive ion bombardment with ion-to-neutral ratio exceeding Ji/Jn = 6. Under these conditions the high diffusion mobility and the reactivity of the C leads to distinct changes in the coatings microstructure and phase composition. spectroscopy and XPS (X-ray photoelectron spectrometer) analysis of the chemical bonding in the films showed that the phase composition of the films gradually transforms from more graphite like (sp2 C–C bonded) to more Me-carbon (Cr–C bonded), where the content of the carbide phase increases with increase of the bias voltage to Ub = − 350 V and higher. In parallel HRTEM (high-resolution transmission electron microscopy) employing HAADF (high-angle annular dark field) imaging revealed that the microstructure evolved from columnar with carbon accumulated at the column boundaries (Ub = − 65 V, − 95 V) to a structure dominated by onion like C–Cr clusters (Ub = − 120 V), which than converts to a distinct nanoscale layered structure (Ub = − 350 V, − 450 V), finally transforming to a uniform fine grain structure at Ub = − 550 V. The new nanoscale layered structure forms via ion irradiation induced self-organisation mechanism. It is characterized by an abnormally large values for the bi-layer thickness of 20 nm and 25 nm, which are not related to substrate rotation, for films grown at Ub = − 350 V and Ub = − 450 V, respectively. ADF (annular dark field) STEM (scanning TEM) imaging and quantitative EELS (electron-energy loss spectroscopy) analysis showed that the nanoscale multilayer structure comprises of alternating layers of Me-carbide phase (48%C, 52%Cr) and almost pure C (91.34%C), where the bias voltage defines the bi-layer thickness. A coating growth model is proposed accounting for the irradiation-induced ion mixing, re-sputtering, condensation surface temperature effects, nucleation and kinetic segregation process, as well as the diffusivity of the coating elements to explain the phase separation and formation of the self-organised layered nanostructure observed in C/Cr coatings.
Keywords :
Bias voltage , Self-organised structure , C/Cr coating , Magnetron sputtering
Journal title :
Surface and Coatings Technology
Serial Year :
2005
Journal title :
Surface and Coatings Technology
Record number :
1810486
Link To Document :
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