Title of article
Langmuir probe measurements in inductively coupled CF4 plasmas
Author/Authors
Huang، نويسنده , , S. and Ning، نويسنده , , Z.Y. and Xin، نويسنده , , Sang Y. and Di Pasquale، نويسنده , , X.L.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2006
Pages
6
From page
3963
To page
3968
Abstract
The characteristics of low-pressure inductively coupled CF4 plasmas have been investigated using a Langmuir probe. The electrons gain energy through the collisionless heating mechanism. In addition, the plasma has two electron populations: low temperature population of electrons with high density, and high temperature population of electrons with low density. With the increase of radio-frequency input power, the former temperature Tce, the latter temperature The, and mean electron temperature Te decrease, while their densities nce, nhe, ne increase. This phenomenon has been explained by the thermodynamic equilibrium of the collision between the electrons and radicals in the plasma.
Keywords
Inductively coupled plasmas , Langmuir Probe , Electron Temperature
Journal title
Surface and Coatings Technology
Serial Year
2006
Journal title
Surface and Coatings Technology
Record number
1811211
Link To Document