Title of article :
The effect of annealing duration at deposition temperature on the strength properties gradation of PVD films and on the wear behaviour of coated cemented carbide inserts
Author/Authors :
Bouzakis، نويسنده , , K.-D. and Skordaris، نويسنده , , G. and Hadjiyiannis، نويسنده , , S. and Mirisidis، نويسنده , , I. and Michailidis، نويسنده , , N. and Erkens، نويسنده , , G. and Wirth، نويسنده , , I.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Pages :
11
From page :
4500
To page :
4510
Abstract :
Strength properties alterations may occur in the already deposited film material during the physical vapour deposition (PVD), induced by annealing, at the process temperature. Similar annealing mechanisms occur in PVD films during heat treatments, at a temperature corresponding to the temperature of the deposition. In the described investigations, cemented carbide inserts were coated through high ionisation sputtering PVD processes with a (Ti46Al54)N film, keeping all process parameters constant except the deposition time, which was set according to the desired film thicknesses. The coated specimens were isothermally annealed at deposition temperature for various time periods. The occurred coating superficial stress–strain laws were determined versus the film thickness through nanoindentations and a FEM-based evaluation method of the corresponding results. The detected film strength properties were correlated to the performance of the corresponding coated cutting inserts. In this way, annealing durations dependent on the coating thickness were predicted, enhancing the tool wear resistance in milling. Finally, the obtained results were theoretically explained by means of a FEM-simulation of the cutting process.
Keywords :
PVD coatings , Isothermal annealing duration , Strength properties gradation , cutting performance , Deposition temperature
Journal title :
Surface and Coatings Technology
Serial Year :
2006
Journal title :
Surface and Coatings Technology
Record number :
1811458
Link To Document :
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