A study of Ti–C–N(H) and Ti:CNx(H) coatings grown with a magnetron sputtering/PECVD hybrid deposition process

In order to optimise multiple layer coatings combining the load supporting capabilities of TiN/TiCN ceramic films with the low friction and wear resistance of an amorphous Me-C:H, single-layer hydrogenated titanium cabonitride thin films (Ti–C–N:H) have been deposited using a hybrid magnetron sputtering/plasma-enhanced chemical vapour deposition system. Single layers of carbon-based coatings, with a broad range of titanium and nitrogen content, as determined by Ion Beam Analysis, have been obtained, showing the process capabilities of exploring the Ti–C–N ternary diagram. Corresponding changes in the crystalline structure have been observed by X-ray diffraction. Nanohardness, elastic modulus and coating adhesion have been measured by nanoindentation and scratch test. Nitrogen content is shown to have a decisive effect on the scratch resistance both at high (50%) and low (12%) titanium content.