Nanocrystalline chromium-based coatings deposited by DLI-MOCVD under atmospheric pressure from Cr(CO)6

Nanocrystalline original Cr-based coatings were grown under atmospheric pressure by Direct Liquid Injection Metal Organic Chemical Vapor Deposition (DLI-MOCVD). The thin films were grown below 450 °C in a cold wall CVD reactor from solutions of Cr(CO)6 in toluene or THF injected and flash vaporized with or without NH3 addition prior to the deposition zone. Original nanocrystalline chromium oxycarbide and oxy-carbonitride phases were deposited on stainless steel substrates. The influence of injection parameters and conventional CVD conditions have been investigated on the main chemical, physical and structural characteristics of the coatings, as deduced from XRD, SEM, and EPMA analyses.