TiN/SiNx submicronic multilayer coatings obtained by chemical vapor deposition in a fluidized bed reactor at atmospheric pressure (AP/FBR-CVD)

TiN/SiNx multilayer coatings were deposited on stainless steel by Chemical Vapor Deposition in a Fluidized Bed Reactor at Atmospheric Pressure (AP/FBR-CVD) by reaction of TiCl4 and SiCl4 with NH3 at 850 °C. Due to the immiscibility of crystalline TiN and amorphous SiNx, interdiffusion between layers is avoided even at the high working temperature. The thickness of the individual layer was in the nanometer range. Coatings were characterized by means of SEM, TEM, GD-OES, SIMS, XRD and nanoindentation. A mechanism for the growth rate and diffusion of Ti and Si into the steel is discussed.