Deposition of TiO2 Films by reactive Inductively Coupled Plasma assisted DC magnetron sputtering for high crystallinity and high deposition rate

TiO2 films with high crystallinity were produced at a high deposition rate by inductively coupled plasma (ICP) assisted reactive magnetron sputtering. X-ray diffraction, UV–VIS spectrophotometer, and an α-step profilometer were used for the analysis of film characterization. The deposition rate was > 20 nm/min and the structure of the TiO2 film changed with the deposition pressure. Anatase phase was obtained at 4 Pa without after-heat treatment, while amorphous and rutile phases were produced at < 2.67 Pa. The optical transmission was changed according to the target surface condition, and was as high as > 80% in the transition mode.