Composition and texture of TiN thin films fabricated by ECR enhanced sputtering deposition

TiN thin films were fabricated on Si (100) substrates using Electron Cyclotron Resonance (ECR) microwave plasma technique. The composition, texture and microstructure of the as-deposited films had been investigated by use of X-ray Photoelectron Spectroscopy, X-ray Diffraction and Scanning Electron Microscopy. TiN compound with atomic ratio N/Ti near 1.2 and (111) preferential orientation was the basic phase, and impurities such as TiO2, Ti2O3 and TiC existed in the films. The cross-sectional morphology of the films was columnar. The effects of the bombardment and the pre-treatment for the substrate surface by energetic ions on the properties of the films were also analyzed.