Structure and properties of TiO2 films prepared by ion beam assisted deposition

In this paper, Titanina films were deposited on glass substrates and silicon wafers by cathode vacuum arc ion plating with ion beam assisted. In the process, titanium metal target was used under an O2/Ar atmosphere, the growing film was simultaneously bombarded with low energy argon ion beam. The structure, surface morphology and UV–Vis spectra of TiO2 films were measured by X-ray diffraction analyses, scanning electron microscopy, atomic force microscopy and ultraviolet–visible spectrometer. The as-deposited films are found to be amorphous. The films were examined to be anatase structure with a (101) preferential orientation. AFM and UV–VIS spectra results showed that fine-pore and the absorption edges of the TiO2 films shifted from 325 nm to 340 nm by ion beam current decreased from 160 mA to 80 mA. It was noted that the photocatalytic ability for the oxidative destruction of Acid Fuchsin (AF) under irradiation of visible light wavelength was decreased by ion beam current increased from 80 mA to 160 mA. The photocatalytic activity of the TiO2 films deposited with ion beam assisted is higher than those deposited without ion beam assisted under irradiation of visible light wavelength.