Title of article
Synthesis of carbon nitride thin films on Si(100) surface by using penning-type discharge sputtering technique
Author/Authors
Li، نويسنده , , H.Y. and Shi، نويسنده , , Y.C. and FENG، نويسنده , , X.P.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2007
Pages
3
From page
6539
To page
6541
Abstract
Carbon nitride thin films (CNx) were successfully synthesized on Si(100) substrate by a using penning-type discharge sputtering technique. The surface morphology of the films was characterized by Atomic Force Microscopy (AFM). The bonding structures in the membrane were characterized by both X-ray photoelectroscopy (XPS) and Fourier transform infrared (FTIR) spectroscopy.
Keywords
Penning-type discharge , Bond structure , Carbon nitride
Journal title
Surface and Coatings Technology
Serial Year
2007
Journal title
Surface and Coatings Technology
Record number
1816216
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