Title of article :
Initiated chemical vapor deposition (iCVD) of polymeric nanocoatings
Author/Authors :
Martin، نويسنده , , Tyler P. and Lau، نويسنده , , Kenneth K.S. and Chan، نويسنده , , Kelvin and Mao، نويسنده , , Yu and Gupta، نويسنده , , Malancha and Shannan OʹShaughnessy، نويسنده , , W. and Gleason، نويسنده , , Karen K.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2007
Abstract :
Initiated chemical vapor deposition of polymers (iCVD) is a process similar to hot-wire CVD (HWCVD) in which a free-radical initiating species is employed to greatly increase the growth rate while decreasing the required energy input. In general, iCVD allows for the deposition of linear polymer, copolymer and/or crosslinked films with a wide range of functions. Surveyed examples include antimicrobial, superhydrophobic, superhydrophilic, and other functional thin polymer films and coatings.
Keywords :
Antimicrobial , plasma polymerization , HWCVD , chemical vapor deposition , Polymer Coating , Polymer thin film
Journal title :
Surface and Coatings Technology
Journal title :
Surface and Coatings Technology
