Title of article
Near cathode optical emission spectroscopy in N2–H2 glow discharge plasma
Author/Authors
Suraj، نويسنده , , K.S. and Bharathi، نويسنده , , P. and Prahlad، نويسنده , , V. and Mukherjee، نويسنده , , S.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2007
Pages
9
From page
301
To page
309
Abstract
Optical emission spectroscopy (OES) is a non-intrusive diagnostic technique, widely used to study different kinds of plasmas. In the present work, a locally resolved OES technique was used to obtain near cathode (substrate) emission spectra for N2–H2 glow discharges. It was observed that, along with N2+ and N2 lines, the characteristic atomic nitrogen lines at 742.3 nm (3p 4S03/2 → 3s 4P1/2), 744.2 nm (3p 4S03/2 → 3s 4P3/2), 746.8 nm (3p 4S03/2 → 3s 4P5/2) and Hα (656.3 nm) were the main emissions coming from the sheath region that shrouded the cathode. A qualitative analysis of the spectral lines near the cathode has been done in order to understand the mechanism of plasma nitriding and the role played by the hydrogen in the nitriding process. The decrease in local intensity of these atomic lines with hydrogen composition suggests that the effect of hydrogen is to enhance the sticking/adsorption of N on the cathode surface.
Keywords
Cathode sheath , Adsorption , Spectral intensity , PLASMA NITRIDING , optical emission spectroscopy
Journal title
Surface and Coatings Technology
Serial Year
2007
Journal title
Surface and Coatings Technology
Record number
1817669
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