Title of article
The effect of oxygen concentration on the low temperature deposition of TiO2 thin films
Author/Authors
Toku، نويسنده , , H. and Pessoa، نويسنده , , R.S. and Maciel، نويسنده , , H.S. and Massi، نويسنده , , M. and Mengui، نويسنده , , U.A.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
6
From page
2126
To page
2131
Abstract
The aim of this study was to investigate the influence of oxygen concentration in Ar/O2 gas mixture on the crystalline properties of TiO2 thin films obtained at low temperature by reactive magnetron sputtering technique. Mass spectrometry of plasma medium provides, in conjunction with XRD and AFM measurements, a guide for attainment of good quality anatase TiO2 films.
Keywords
morphology , Thin films , Titanium dioxide , sputtering , surface structure
Journal title
Surface and Coatings Technology
Serial Year
2008
Journal title
Surface and Coatings Technology
Record number
1818328
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