Title of article :
Uniformity of 500-mm cylindrical plasma source sustained with multiple low-inductance antenna units
Author/Authors :
Setsuhara، نويسنده , , Yuichi and Tsukiyama، نويسنده , , Daisuke and Takenaka، نويسنده , , Kosuke، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2008
Pages :
4
From page :
5238
To page :
5241
Abstract :
Uniformity of plasma density and 4s excited Ar (Ar⁎) density profiles in a 500-mm cylindrical plasma source sustained with eight LIA units have been investigated with a fluid-simulation code. Uniformity of the simulated radial profiles of plasma density on the substrate holder located at a distance of 300 mm from a top flange became better with increasing Ar pressure from 1.3 Pa to 6.7 Pa. The radial uniformity of plasma density in the central 300 mm region was evaluated to be approximately 4.0% at 6.7 Pa. Uniformity of the radial profiles of Ar⁎ density became better with increasing distance of the substrate holder to the down-stream region. In the present antenna configuration, fairly uniform radial profiles of Ar⁎ density can be obtained at a distance of 300 mm from the top flange.
Keywords :
Plasma source , Internal antenna , Fluid simulation , Uniformity , ICP
Journal title :
Surface and Coatings Technology
Serial Year :
2008
Journal title :
Surface and Coatings Technology
Record number :
1819418
Link To Document :
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