Title of article
Mechanical properties of TaN-Cu nanocomposite thin films
Author/Authors
Hsieh، نويسنده , , J.H. and Liu، نويسنده , , P.C. and Li، نويسنده , , C. and Cheng، نويسنده , , M.K. and Chang، نويسنده , , S.Y.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
5
From page
5530
To page
5534
Abstract
TaN-Cu nanocomposite films were deposited by reactive co-sputtering on tool steel substrates. The films were then annealed using RTA (Rapid Thermal Annealing) at 400 °C for 2, 4, 8 min respectively to induce the nucleation and growth of Cu particles in the TaN matrix and on the film surface. Indentation method was used to examine the mechanical properties of these films. The results confirm that annealing by RTA can cause Cu nano-particles with various dimensions to form on and in the TaN matrix. Consequently, hardness and toughness will change depending on annealing conditions, Cu content, and/or Cu particle density. The strengthening and toughening mechanisms are discussed.
Keywords
Co-sputtering , TaN-Cu , Nanocomposite thin films , Annealing
Journal title
Surface and Coatings Technology
Serial Year
2008
Journal title
Surface and Coatings Technology
Record number
1819575
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