Activated calcium silicate thinfilm by He plasma treatments

Calcium phosphate forming ability of thin calcium silicates film formed by electron-beam evaporation has been reported. Increasing calcium concentration in calcium silicates is necessary to provide high bioactivity, but there is limitation due to mechanical strength. In this paper, plasma treatment was proposed as post-treatment process for calcium silicate thinfilm to acquire high bioactivity. Thinfilm of calcium silicate was synthesized on titanium coated silicon wafer by means of electron-beam evaporation, and then annealed at 400 °C in air prior to helium atmospheric pressure dielectric barrier discharge (He-AP-DBD) treatment. He-AP–DBD treatment introduced hydrophilic surface with hydroxyl functional group on calcium silicate surface, and calcium phosphate formation was accelerated in phosphate buffered saline (PBS) containing CaCl2.