Title of article :
Synthesis and characterization of nano-composite Ti–Si–N hard coating by filtered cathodic arc deposition
Author/Authors :
Chang، نويسنده , , Chi-Lung and Chen، نويسنده , , Jun-Han and Tsai، نويسنده , , Pi-Chuen and Ho، نويسنده , , Wei-Yu and Wang، نويسنده , , Da-Yung، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2008
Pages :
5
From page :
619
To page :
623
Abstract :
Nano-composite Ti–Si–N films were deposited on tungsten carbide substrates by a filtered cathodic arc deposition system using TiSi-alloy as arc sources. The influences of bias voltages on the microstructure, mechanical and corrosion properties of the films were investigated. Field emission scanning electron microscope, atomic force microscopy, X-ray diffractometer, X-ray photoelectron spectroscopy, high-resolution electron probe microanalyzer, polarization and immersion tests were employed to identify microstructures and properties of Ti–Si–N films. Both magnetic 90°-filter duct arc source and substrate bias voltage have important effects on the surface roughness, microstructure and corrosion properties of Ti–Si–N coatings. The results showed that both the increase of Si content and decrease of grain size resulted from the increase of substrate bias voltage. The microhardness of the coatings was enhanced by increasing substrate bias voltage. The corrosion resistance of coatings tested in 1 N H2SO4 solution confirmed that Ti–Si–N coatings with a magnetic 90°-filter duct arc source were better than Ti–Si–N coatings without a magnetic 90°-filter duct arc source due to the effect of reducing microparticles. On the other hand, the corrosion resistance is also increased with reducing surface roughness of Ti–Si–N films, which can be controlled by substrate bias voltage in deposition process.
Keywords :
Ti–Si–N film , Filtered cathodic arc deposition , CORROSION RESISTANCE , Roughness
Journal title :
Surface and Coatings Technology
Serial Year :
2008
Journal title :
Surface and Coatings Technology
Record number :
1820101
Link To Document :
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