Title of article :
GaN-core/SiOx-sheath nanowires
Author/Authors :
Kim، نويسنده , , Hyoun Woo and Lee، نويسنده , , Jong-Woo and Kim، نويسنده , , Hyo Sung and Kebede، نويسنده , , Mesfin Abayneh Kebede، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2008
Pages :
4
From page :
666
To page :
669
Abstract :
We have fabricated GaN-core/SiOx-sheath nanowires, sheathing the core MgO nanowires by sputtering with Si target. The product has wire-like morphology, regardless of SiOx-sheathing and subsequent annealing. EDX elemental mapping results have coincided with what can be expected for the SiOx-coated GaN nanowires. The core nanowires correspond to a hexagonal GaN structure, whereas the sheath layer is amorphous. Gaussian fitting analysis on the photoluminescence spectra of GaN-core/SiOx-sheath nanowires have exhibited two emission bands peaked at 2.4 eV and 2.9 eV, respectively. We observed that the relative intensity of 2.9 eV-peak to 2.4 eV-peak was increased by the thermal annealing.
Keywords :
GaN , nanowires , SiOx , sputtering
Journal title :
Surface and Coatings Technology
Serial Year :
2008
Journal title :
Surface and Coatings Technology
Record number :
1820121
Link To Document :
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