• Title of article

    GaN-core/SiOx-sheath nanowires

  • Author/Authors

    Kim، نويسنده , , Hyoun Woo and Lee، نويسنده , , Jong-Woo and Kim، نويسنده , , Hyo Sung and Kebede، نويسنده , , Mesfin Abayneh Kebede، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2008
  • Pages
    4
  • From page
    666
  • To page
    669
  • Abstract
    We have fabricated GaN-core/SiOx-sheath nanowires, sheathing the core MgO nanowires by sputtering with Si target. The product has wire-like morphology, regardless of SiOx-sheathing and subsequent annealing. EDX elemental mapping results have coincided with what can be expected for the SiOx-coated GaN nanowires. The core nanowires correspond to a hexagonal GaN structure, whereas the sheath layer is amorphous. Gaussian fitting analysis on the photoluminescence spectra of GaN-core/SiOx-sheath nanowires have exhibited two emission bands peaked at 2.4 eV and 2.9 eV, respectively. We observed that the relative intensity of 2.9 eV-peak to 2.4 eV-peak was increased by the thermal annealing.
  • Keywords
    GaN , nanowires , SiOx , sputtering
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2008
  • Journal title
    Surface and Coatings Technology
  • Record number

    1820121