Title of article
GaN-core/SiOx-sheath nanowires
Author/Authors
Kim، نويسنده , , Hyoun Woo and Lee، نويسنده , , Jong-Woo and Kim، نويسنده , , Hyo Sung and Kebede، نويسنده , , Mesfin Abayneh Kebede، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
4
From page
666
To page
669
Abstract
We have fabricated GaN-core/SiOx-sheath nanowires, sheathing the core MgO nanowires by sputtering with Si target. The product has wire-like morphology, regardless of SiOx-sheathing and subsequent annealing. EDX elemental mapping results have coincided with what can be expected for the SiOx-coated GaN nanowires. The core nanowires correspond to a hexagonal GaN structure, whereas the sheath layer is amorphous. Gaussian fitting analysis on the photoluminescence spectra of GaN-core/SiOx-sheath nanowires have exhibited two emission bands peaked at 2.4 eV and 2.9 eV, respectively. We observed that the relative intensity of 2.9 eV-peak to 2.4 eV-peak was increased by the thermal annealing.
Keywords
GaN , nanowires , SiOx , sputtering
Journal title
Surface and Coatings Technology
Serial Year
2008
Journal title
Surface and Coatings Technology
Record number
1820121
Link To Document