Title of article :
Studies of swift iron ions in crystalline silicon
Author/Authors :
Kachhap، نويسنده , , N.K. and Dubey، نويسنده , , S.K. and Dubey، نويسنده , , R.L. and Yadav، نويسنده , , A.D. and Kanjilal، نويسنده , , D. and Deshpande، نويسنده , , S.K.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2009
Pages :
5
From page :
2422
To page :
2426
Abstract :
P-type silicon samples were irradiated with 56Fe7+ ions for different ion fluences varying from 1 × 1013 to 5 × 1014 cm− 2 at 100 MeV. Atomic force microscopy study showed the group of nanoclusters on the surface of <111> silicon. The size, shape and diameter of the nanoclusters are found to be strongly influenced by ion fluence. Three dimensional atomic force microscopy images of the samples irradiated with different ion fluences showed hillocks surrounded with valleys. Grazing angle X-ray diffraction study revealed the formation of different phases of FeSi2 depending on ion fluences. The interference fringes observed in the Fourier transform infrared studies revealed the presence of FeSi2 layer with a thickness comparable to ion range. The decay of the fringe amplitudes with wave number indicates non constant dielectric constants.
Keywords :
GXRD and FTIR , Silicon , Swift iron ion irradiation , AFM
Journal title :
Surface and Coatings Technology
Serial Year :
2009
Journal title :
Surface and Coatings Technology
Record number :
1820758
Link To Document :
بازگشت