Title of article :
Composition–constitution–morphology relationship of Al2O3 thin films deposited by plasma assisted chemical vapor deposition
Author/Authors :
Snyders، نويسنده , , Rony and Jiang، نويسنده , , Kaiyun and Music، نويسنده , , Denis and Konstantinidis، نويسنده , , Stephanos and Markus، نويسنده , , Torsten and Reinholdt، نويسنده , , Alexander and Mayer، نويسنده , , Joachim and Schneider، نويسنده , , Jochen M.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2009
Pages :
7
From page :
215
To page :
221
Abstract :
We have studied the correlation between the chemical composition, constitution and morphology of Al2O3 using experimental and theoretical means. Combining scanning electron microscopy, transmission electron microscopy, electron dispersive X-ray analysis and ab initio calculations, we have investigated the formation of pores. Desorption measurements show chlorine release from γ- and α-alumina films. Based on ab initio calculations, we have established that Cl can be incorporated in both γ- and α-alumina. Furthermore, two Cl atoms are likely to agglomerate since the total energy is reduced, compared to an unagglomerated configuration. We propose that Cl agglomeration is the first step towards Cl2 formation and subsequent precipitation and bubble formation. It can be learned that the Cl incorporation has to be minimized during growth of dense alumina coatings.
Keywords :
PECVD alumina , Ab initio calculations , Bubble formation , Cl incorporation
Journal title :
Surface and Coatings Technology
Serial Year :
2009
Journal title :
Surface and Coatings Technology
Record number :
1821378
Link To Document :
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