Title of article :
Highly enhanced mechanical stability of indium tin oxide film with a thin Al buffer layer deposited on plastic substrate
Author/Authors :
Sim، نويسنده , , Boyeon and Kim، نويسنده , , Eun-He and Park، نويسنده , , Jinwoo and Lee، نويسنده , , Myeongkyu Lee، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2009
Pages :
4
From page :
309
To page :
312
Abstract :
We here report that the mechanical stability of indium tin oxide (ITO) film deposited on the plastic substrate can be highly enhanced by a thin metal buffer layer with a minimized loss of transparency. Neither cracks nor fragmentation was observed for a 75 nm-thick ITO film with a 5 nm-Al layer even after severe bending to a radius of curvature of 1.25 mm, while a 160 nm-ITO film of similar surface resistance was cracked at 9 mm. The improved crack resistance is accounted for by the fact that the effective elastic mismatch between the film and the substrate can be alleviated with a ductile buffer layer, thus the crack propagation is suppressed.
Keywords :
indium tin oxide , Buffer layer , Thin film mechanics , crack resistance
Journal title :
Surface and Coatings Technology
Serial Year :
2009
Journal title :
Surface and Coatings Technology
Record number :
1821412
Link To Document :
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