• Title of article

    An in-situ monitor to measure the momentum flux during physical vapour deposition

  • Author/Authors

    Mahieu، نويسنده , , S. and Depla، نويسنده , , D.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2010
  • Pages
    4
  • From page
    2085
  • To page
    2088
  • Abstract
    A tool to measure the momentum flux during physical vapour deposition has been developed. This tool basically consists of a torsion plate, i.e. a plate hooked up by a thin wire. Due to the impingement of particles, the torsion plate will rotate. Measuring this rotation allows the user to quantify the momentum flux towards the substrate during physical vapour deposition. The measurement of the momentum flux during reactive magnetron sputtering as a function of several deposition parameters, such as target-substrate distance, discharge current, pressure or reactive gas flow, is demonstrated in this paper. Also a relation with the mechanical properties is shown.
  • Keywords
    Monitoring tool , Momentum flux , Magnetron sputtering
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2010
  • Journal title
    Surface and Coatings Technology
  • Record number

    1822116