Magnetohydrodynamic modeling for an OVD reactor setup

A three-dimensional magnetohydrodynamic model of an inductively coupled plasma depositor has been developed and applied to describe the process of outside vapor deposition during manufacturing of preforms for optical fibers. The steady state continuity, momentum, enthalpy and diffusion equations are solved consistently with the energy coupling accomplished through the electromagnetic field of an induction coil and the radiation losses from the plasma. Local thermodynamic equilibrium, steady and laminar flow, and optically thin plasma are assumed. A chemical surface reaction serving as a boundary condition for species mass fractions in the fluid is set to describe the deposition process. The model supplies information about the flow and temperature distribution of the fluid, the electromagnetic field, and the deposition rate on the target surfaces for complex real geometries.