Title of article :
Microtribological and corrosion behaviors of 1H,1H,2H,2H-perfluorodecanethiol self-assembled films on copper surfaces
Author/Authors :
Patois، نويسنده , , Tilia and Et Taouil، نويسنده , , Abdeslam and Lallemand، نويسنده , , Fabrice and Carpentier، نويسنده , , Luc and Roizard، نويسنده , , Xavier and Hihn، نويسنده , , Jean-Yves and Bondeau-Patissier، نويسنده , , Virginie and Mekhalif، نويسنده , , Zineb، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2010
Pages :
7
From page :
2511
To page :
2517
Abstract :
Fluoroorganic monolayers adsorped on copper are studied in terms of organization, structure, electrochemical behavior, corrosion and tribological properties. 1H,1H,2H,2H-perfluorodecanethiol thin films are grafted on copper via a self-assembling process. PM-IRRAS and XPS were used to investigate the organization, composition and structural properties of the SAMs. Cyclic voltammetry studies revealed a good oxidation blocking factor and polarization curves showed good anti-corrosion properties for the fluoroorganic film. However, these properties were inferior to those of n-dodecanethiol based SAMs. This was accounted for by the lower packing density and the larger number of defects of the 1H,1H,2H,2H-perfluorodecanethiol SAMs probably due to electrostatic and steric repulsion between fluorine atoms along the carbon chain and a number of CH2 groups insufficient to permit good organization. ne groups present in the monolayer of the fluoroorganic SAMs led to excellent lubricant properties for the ultrathin film. Surface wear resistance was also improved thanks to SAM grafting. 1H,1H,2H,2H-perfluorodecanethiol SAMs thus appear to be very interesting lubricants for copper as they improve surface mechanical properties by diminishing surface friction and wear.
Keywords :
Microtribological behavior , PM-IRRAS , XPS , 1H , 1H , 2H , 2H-perfluorodecanethiol , Self-assembled monolayer (SAMs)
Journal title :
Surface and Coatings Technology
Serial Year :
2010
Journal title :
Surface and Coatings Technology
Record number :
1823750
Link To Document :
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