Title of article :
Role of complexing ligands in trivalent chromium electrodeposition
Author/Authors :
Zeng، نويسنده , , Zhixiang and Zhang، نويسنده , , Yingxin and Zhao، نويسنده , , Wenjie and Zhang، نويسنده , , Junyan، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2011
Pages :
5
From page :
4771
To page :
4775
Abstract :
In this study, the Cr(III)-formate, Cr(III)-oxalate and Cr(III)-glycine electrolytes are used as sources for electrodepositing the Cr coatings. The deposition rate and brightness range of the electroplating process in these electrolytes are investigated. The geometric structures of the Cr complex ions are optimized, using density functional theory with General Gradient Approximation/Perdew-Wang 91 (GGA/PW91) calculation. It is found that the deposition rate and brightness range significantly depend on the geometric structure of the Cr(III)-ligand complex ions. The expansion of the distance between Cr and H2O induced by the introduced complexing ligand is a necessary condition for the electrochemical reduction of Cr(III) to metal Cr. The dehydration rate of Cr(III)-ligand complex ions determines the electroplating characteristics of electrolytes.
Keywords :
Complexing ligand , Electroreduction , Geometric structure , Trivalent chromium
Journal title :
Surface and Coatings Technology
Serial Year :
2011
Journal title :
Surface and Coatings Technology
Record number :
1824511
Link To Document :
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