Title of article
Crystallization kinetics of amorphous Cr2AlC thin films
Author/Authors
Ahmed Abdulkadhim، نويسنده , , Ahmed and Baben، نويسنده , , Moritz to and Takahashi، نويسنده , , Tetsuya and Schnabel، نويسنده , , Volker and Hans، نويسنده , , Marcus and Polzer، نويسنده , , Conrad and Polcik، نويسنده , , Peter and Schneider، نويسنده , , Jochen M.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2011
Pages
5
From page
599
To page
603
Abstract
Amorphous Cr2AlC thin films were produced by room temperature magnetron sputtering on NaCl substrates with subsequent dissolution of the NaCl. The crystallization kinetics of Cr2AlC was investigated by differential scanning calorimetry (DSC) and X-ray diffraction (XRD). Two exothermal reactions are observed during DSC up to 1200 °C. Comparing lattice parameters obtained from XRD and ab initio calculations it is suggested that the first reaction is associated with the formation of hexagonal (Cr,Al)2Cx, while after the second reaction Cr2AlC is formed. The activation energy for the phase transformations are 426 and 762 kJ/mol, respectively.
Keywords
crystallization , MAX phase , transformation kinetics , Amorphous thin films
Journal title
Surface and Coatings Technology
Serial Year
2011
Journal title
Surface and Coatings Technology
Record number
1824962
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