AlNx and a-SiOx coatings with corrosion resistance properties for dental implants

Aluminium nitride thin films were deposited on titanium fixtures, while silicon oxide thin films were deposited on titanium fixtures and chromium–cobalt substrates, using the RF magnetron sputtering technique. Each coating showed different corrosion behaviours when electrochemical characterisations were made in a simulated biological environment, i.e. Hankʹs solution. Although aluminium nitride was more effective in reducing the localised corrosion on titanium implants, silicon oxide showed the best behaviour against general corrosion and results were consistent for the two kinds of substrates. Moreover the application of a SiO2/AlN bilayer onto the Ti fixtures improved the performances of each separate coating. When the coated surfaces were compared to uncoated substrates, there was no statistically significant difference in cell viability in the response of two different human osteoblastic cell lines — Saos-2 and MG-63. Field emission scanning electron microscopy assessed the surface morphology of coated and uncoated samples, whilst Fourier transform infrared spectroscopy was applied to investigate the bonding structure of barrier layers on silicon samples. On the basis of the data obtained, we are of the opinion that the tested materials show some promising characteristics for the fabrication of novel dental implants with reduced ion release properties.