Influence of RF magnetron sputtering conditions on the properties of transparent conductive gallium-doped magnesium zinc oxide thin films

Gallium-doped magnesium zinc oxide (GMZO) thin films were deposited onto glass substrates using RF magnetron sputtering using GMZO ceramic targets under different sputtering conditions. The substrate temperature and deposition pressure effects on the structural, electrical and optical properties of the GMZO thin film were investigated. Transparent conductive GMZO thin films were demonstrated in this study to possess a wurtzite structure, average transmittance above 80% in the 400 nm and 800 nm wavelength range with a low resistivity of 1.62 × 10− 3 Ω cm when deposited onto glass substrates using RF magnetron sputtering.