Title of article
Elaboration and characterization of Fe/silica-nanofilm tailored surfaces
Author/Authors
Koltsov، نويسنده , , Alexey and Pavlova، نويسنده , , Lydia and Kukin، نويسنده , , Vladimir S. Prikhodko، نويسنده , , Alexander and Cornu، نويسنده , , Marie-José and Kirilenko، نويسنده , , Elena، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2014
Pages
9
From page
39
To page
47
Abstract
PECVD method with subsequent photolithography process has been used to create different tailored surfaces of Fe/silica with silicon oxide representative to that formed during recrystallization annealing of Si alloyed steels, i.e. stoichiometric, amorphous and about 50 nm in thickness. The tailored surfaces have been characterized by different analytical techniques like XPS, AES, Raman, FIB-TEM, AFM and mechanical profilometry.
Keywords
Photolithography , Iron , PECVD , Silicon oxide , patterning , Thin films
Journal title
Surface and Coatings Technology
Serial Year
2014
Journal title
Surface and Coatings Technology
Record number
1830535
Link To Document