Title of article
Poly(tetrafluoroethylene) sputtering in a gas aggregation source for fabrication of nano-structured deposits
Author/Authors
Serov، نويسنده , , A. and Choukourov، نويسنده , , A. and Melnichuk، نويسنده , , I. and Shelemin، نويسنده , , A. and Kuzminova، نويسنده , , A. and Kyli?n، نويسنده , , O. and Hanu?، نويسنده , , J. and Kousal، نويسنده , , J. and Dr?bik، نويسنده , , M. and Slav?nsk?، نويسنده , , D. and Biederman، نويسنده , , H.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2014
Pages
8
From page
319
To page
326
Abstract
R. f. magnetron sputtering of poly(tetrafluoroethylene) in configuration of a gas aggregation source is shown to produce super-hydrophobic nano-structured coatings in which cross-linked nano-particles of fluorocarbon plasma polymer are embedded in an uncross-linked continuous (CF2)x matrix. The 20–30 nm nano-particles appear in proximity of the magnetron and have cross-linked structure as a result of fast random radical recombination in the plasma. The continuous phase is formed at remote distances from the magnetron as a result of slower step-growth gas phase polymerization of CF2 bi-radicals. The matrix has highly crystalline structure in which the CF2 groups tend to adopt a 15/7 helical configuration. At least part of the macromolecules constituting the polymeric phase are oligomers with the molar mass below 1400 g/mol.
Keywords
Gas aggregation source , Nano-particles , Magnetron sputtering , Plasma polymer , Poly(tetrafluoroethylene)
Journal title
Surface and Coatings Technology
Serial Year
2014
Journal title
Surface and Coatings Technology
Record number
1831034
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