Oxidation of ZrAlSiN nano-multilayered thin films between 400 and 600 °C

Quaternary ZrAlSiN thin films with a composition of 35Zr–6.2Al–1Si–57.2N–0.6O (at.%) were deposited on steels by cathodic arc plasma deposition. They consisted primarily of alternating ZrN/AlSiN nano-multilayers. Their oxidation behavior was studied at 400–600 °C for up to 30 h in air. They exhibited poor oxidation resistance because of the splitting and peeling of the oxide layers that consisted primarily of (Al, Si)-dissolved α-ZrO2.