Application of dense nano-thin platinum films for low-temperature solid oxide fuel cells by atomic layer deposition

Nano-thin platinum (Pt) films with a dense microstructure for low-temperature solid oxide fuel cells (LT-SOFCs) were fabricated by atomic layer deposition (ALD) and were characterized in terms of their micro-structural properties and electrochemical performance. Pt thin films with a purity level of ∼99% were achieved by controlling the O2 pulsing time. The agglomeration behavior of the ALD Pt thin films was characterized by the annealing temperature, becoming extremely severe above 550 °C. An LT-SOFC with a 25 nm thick dense ALD Pt cathode layer exhibited a peak power density of ∼110 mW/cm2 at 450 °C.