Title of article
IR laser-induced chemical vapour deposition of silicon oxycarbide phases from 1,1,3,3-tetramethyldisiloxane
Author/Authors
Josef Pola، نويسنده , , Dana Pokorn?، نويسنده , , Zden k Bastl، نويسنده , , Jan ubrt، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1996
Pages
7
From page
153
To page
159
Keywords
chemical vapour deposition , Si/C/H/O films , Laser induced decomposition , 1 , 3 , 1 , 3-TetramethyldisiloxaneArticle Outline
Journal title
Journal of Analytical and Applied Pyrolysis
Serial Year
1996
Journal title
Journal of Analytical and Applied Pyrolysis
Record number
188234
Link To Document