Metallization and nanostructuring of semiconductor surfaces by galvanic displacement processes

The deposition of metals on semiconductors encompasses a broad range of technologically important processes, with applications ranging from electronic devices to chemical sensors. Recent years have witnessed a surge of research activities in galvanic displacement processes on semiconductor substrates. After a brief review of the fundamental aspects underlying galvanic displacement processes on semiconductor surfaces, this paper discusses applications to micro- and nanoscale devices, including schemes developed for the metallization and nanopatterning of semiconductor substrates with high selectivity and with optimal interfacial properties.