Author/Authors :
Xu، نويسنده , , Congkang and Kim، نويسنده , , Misuk and Chung، نويسنده , , Sangyong and Chun، نويسنده , , Junghwan and Kim، نويسنده , , Dong-Eon Kim، نويسنده ,
Abstract :
SiGaN/SiOxNy nanocables and SiOxNy-based nanostructures on silicon and silica substrates, respectively, have been firstly synthesized via using GaN as a resource of Ga. The silica wafer is mainly responsible for the formation of SiOxNy-based nanostructures and the intermediate Ga plays an important role in the formation of diverse nanostructures. SEM, TEM, line scan and SAED were employed to characterize as-prepared samples. The growth mechanism of as-prepared samples is also discussed.