Title of article :
Faceting of Si nanocrystals embedded in SiO2
Author/Authors :
Wang، نويسنده , , Y.Q. and Smirani، نويسنده , , R. and Schiettekatte، نويسنده , , F. and Ross، نويسنده , , G.G.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
5
From page :
129
To page :
133
Abstract :
Faceting has been observed in some Si nanocrystals (Si nc) embedded in SiO2 using high-resolution transmission electron microscopy (HRTEM). Statistical analyses of the interface-energy (Si nc/SiO2) ratios for different facets of the single-crystalline Si nc have been carried out. For these single-crystalline Si nc, the interfacial energy ratios of {1 0 0} and {1 1 3} relative to {1 1 1} facets, are 1.1 and 0.89, respectively. The influences of planar defects such as twins and stacking faults on the faceting and interfacial energy of Si nc/SiO2 are discussed in terms of their possible contribution to the interfacial energy.
Journal title :
Chemical Physics Letters
Serial Year :
2005
Journal title :
Chemical Physics Letters
Record number :
1915696
Link To Document :
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