Title of article :
Dual-level direct dynamics studies on the reactions of OH radicals with SiH3CH3 and SiH4
Author/Authors :
Zhang، نويسنده , , Hui and Li، نويسنده , , Ze-sheng and Wu، نويسنده , , Jia-Yan and Liu، نويسنده , , Jing-yao and Sheng، نويسنده , , Li and Sun، نويسنده , , Chia-chung، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
7
From page :
355
To page :
361
Abstract :
The multiple-channel reaction SiH3CH3 + OH → products (R1) and the single-channel reaction SiH4 + OH → SiH3 + H2O (R2) have been studied by the direct dynamics method at the QCISD(T)/6-311++G(3df,3pd)//BH&H-LYP/6-311G(d,p) level. The rate constants for those reactions are calculated by improved canonical variational transition state theory (ICVT) with small-curvature tunneling (SCT) contributions in a temperature range 200–3000 K. For reaction (R1), H-abstraction from the SiH3 group is the major channel. Since methyl substitution increases the reactivity of Si–H bond in silane, the rate constants of (R1) are larger than those of (R2) over the whole temperature region.
Journal title :
Chemical Physics Letters
Serial Year :
2005
Journal title :
Chemical Physics Letters
Record number :
1915766
Link To Document :
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