Title of article :
TiO2 nanotube layers: Dose effects during nitrogen doping by ion implantation
Author/Authors :
Ghicov، نويسنده , , Andrei and Macak، نويسنده , , Jan M. and Tsuchiya، نويسنده , , Hiroaki and Kunze، نويسنده , , Julia and Haeublein، نويسنده , , Volker and Kleber، نويسنده , , Sebastian and Schmuki، نويسنده , , Patrik، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Pages :
4
From page :
426
To page :
429
Abstract :
TiO2 nanotubes were produced by self-organized electrochemical oxidation of Ti. The tubes were N-ion implanted at two nominal fluencies, 1 × 1015 and 1 × 1016 ions/cm2. Implantation was carried out into amorphous and crystalline (anatase) tubes. lectrochemical, SEM and XRD measurements show successful doping at a dose of 1 × 1016 ions/cm2, however the ion implantation process causes strong structural alterations. Amorphous tubes show a disintegration of the morphological integrity, while anatase tubes are ‘amorphized’. This amorphization leads to a decrease of photoresponse in the UV range, but the N-doping results in a strong sub-band gap response.
Journal title :
Chemical Physics Letters
Serial Year :
2006
Journal title :
Chemical Physics Letters
Record number :
1917634
Link To Document :
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