Title of article :
The dynamics of NO radical formation in the UV 266 nm photodissociation of nitroethane
Author/Authors :
Li، نويسنده , , Yamin and Sun، نويسنده , , Julong and Han، نويسنده , , Keli and He، نويسنده , , Guozhong and Li، نويسنده , , Zhuangjie، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Pages :
5
From page :
232
To page :
236
Abstract :
Photodissociation of gaseous nitroethane at 266 nm has been studied by monitoring the NO(X2Π) product using laser-induced fluorescence technique. Rotational state distributions of the NO(X2Π1/2 and X2Π3/2, v″ = 0) photofragment have been measured and characterized by Boltzmann temperature of 810 ± 100 K. Only the NO photoproduct in v″ = 0 state can be observed in the present work. The geometries of the nitroethane, the ethyl nitrite and the transition state connecting the two isomeric structures have been investigated using ab initio method. The photodissociation dynamics of nitroethane is discussed on the basis of experimental observation and calculation results.
Journal title :
Chemical Physics Letters
Serial Year :
2006
Journal title :
Chemical Physics Letters
Record number :
1918098
Link To Document :
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