Author/Authors :
Ayala، نويسنده , , P. and Grüneis، نويسنده , , A. and Grimm، نويسنده , , D. and Kramberger، نويسنده , , C. and Engelhard، نويسنده , , R. and Rümmeli، نويسنده , , M. and Schumann، نويسنده , , J. and Kaltofen، نويسنده , , R. and Büchner، نويسنده , , B. and Schaman، نويسنده , , C. and Kuzmany، نويسنده , , H. and Gemming، نويسنده , , T. and Barreiro، نويسنده , , A. and Pichler، نويسنده , , T.، نويسنده ,
Abstract :
An innovative staged chemical vapor deposition (SCVD) approach providing flexible control over the feedstock type during single wall carbon nanotube (SWNTs) growth is proposed. The efficiency of staged growth by means of a cyclohexane/methane system using thin film catalysts is here illustrated. The mechanism involves the nucleation stage efficiently triggered by cyclohexane, followed by methane assisting a growth stage yielding high purity SWNTs vertically aligned with lengths of several hundred μm. In addition, SCVD also facilitates catalyst free SWNT detachment enabling repeated growth.
